Micro-fabrication in IMSE Cleanroom

Home Research Applications Equipment Information Technical Info Recipes Policies iLab

Acid Fume Hood AJA E-beam Evaporator ALD Instrument Asher Disco Dicing Saw Ellipsometer Heidelberg Laser Writer Mask Aligner 3" Mask Aligner 4" Nanofab PECVD Sytem Optical Microscope (Class 100) Optical Microscope (Class 10,000) Parylene Deposition System Probe Station Profilometer Reactive Ion Etch (RIE) CR-Solvent Fume Hood (1) CR-Solvent Fume Hood (2) L27-PDMS Fume Hood L27-Solvent Hood-A L27-Solvent Hood-B L27-Acid Hood Spin Coater Sputter Deposition Tool Thermal Evaporator Tube Furnace UV Ozone Cleaner

UV Ozone Cleaner

Book a Reservation/Equipment Availability - Request Training

UVOCS UV based Ozone cleaner is used to clean remaining small residues on thin films surfaces such as silicon, gold and aluminum under ambient conditions. Cleaned surfaces can also be used to improve adhesion in certain processes. This is not meant to remove gross resist or organic surfaces with thickness greater than 100 nm. Gross material should be removed with wet chemistries. Certain halide residues are not allowed as they could corrode the interior parts.

IMSE Contact & Approved Trainer:
Rahul Gupta (rgupta24@wustl.edu)


Technical Info:
Instrument features