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UVOCS UV based Ozone cleaner is used to clean remaining small residues on thin films surfaces such as silicon, gold and aluminum under ambient conditions. Cleaned surfaces can also be used to improve adhesion in certain processes. This is not meant to remove gross resist or organic surfaces with thickness greater than 100 nm. Gross material should be removed with wet chemistries. Certain halide residues are not allowed as they could corrode the interior parts.

IMSE Contact & Approved Trainer:
Rahul Gupta (rgupta24@wustl.edu)

Recipe:
N/A

Technical Info:
Instrument features