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Oxford Instrument's Nanofab provides the capability to deposit thin films of SiO2, SiN, p-Si, a-Si, Graphene, Nanotubes, etc. The standard gasses connected to the instrument are Ar, N2O, N2, CH4, 2%SiH4 in Ar, NH3, and H2. For more process capability, please contact IMSE staff.

IMSE Contact & Approved Trainer:
Rahul Gupta (rgupta24@wustl.edu)

Training Documents:
NOTE: User must demonstrate skills to IMSE staff before independent use.
Operating instructions

Recipe:
Click here to see existing recipes

Technical Info:
Instrument Specifications