Book a Reservation/Equipment Availability - Request Training

PE 50 Asher, manufactured by Plasma Etch, uses Oxygen plasma to remove organic materials such as photoresist. It can be operated either in RIE mode or in soft Plasma Etching/Ashing mode. Other gases can be included to tweak etching/ashing performance. RF power of up to 100 W can be applied.

IMSE Contact & Approved Trainer:
Rahul Gupta (rgupta24@wustl.edu)

Training Documents:
NOTE: User must demonstrate skills to IMSE staff before independent use.
Operating instructions

Recipe:
N/A

Technical Info:
Instrument Specifications