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The Optical microscope (Zeiss AxioSkop) in cleanroom (Class 100) can measure feature sizes below 1 micrometer. The following objective lenses are available: 5x, 10x, 20x, and 50x. Other applications include:

• Instrument is also useful in making a qualitative assessment on when the chemcial development process during lithoraphy has been successfully completed. Surface contrast and roughness helps in making the determination.
• Verifying undercut in a two-layer lithography process as part of metal layer patterning by a lift-off technique

IMSE Contact & Approved Trainer:
Rahul Gupta (rgupta24@wustl.edu)

Recipe:
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Technical Info:
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