Micro-fabrication in IMSE Cleanroom

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MJB Mask Aligner (3") Laser Writer ICP/RIE Nanofab/PECVD Sputtering Deposition Thermal Evaporator Deposition Tube Furnace Wet etching Miscellaneous

Recipies

Recipes listed below have been tested by IMSE staff at some point in past. These are not guaranteed to work. Please use these as a starting point in developing your recipe.

MJB Mask Aligner (3" diameter)

AZP4620 resist process
SU8-2050 resist process
S1805 resist process


Laser Writer

AZ 1500 resist process
AZP4620 resist process
KL IR 15 resist process
S1805 resist process
AutoCAD Guidelines
Mask Preparation
AutoCAD alignment template
AutoCAD alignment template for Mask based Alignment
Guidelines for FS/BS alignment marks
GrayScale Template


ICP/RIE

Bosch Si etch performance
Si etch (continuous etch) performance
SiO2 etch performance
SiN etch performance
Repeatability tests
Resist etch rate (O2 plasma)


Nanofab/PECVD

SiO2 deposition
SiN deposition
Poly-Si deposition


Sputtering Deposition

Aluminum deposition
Cr deposition
Cu deposition
Nb deposition
SiO2 deposition
ZnO deposition


Thermal Evaporator Deposition

Ag deposition
Au deposition


Tube Furnace

Oxidation rates


Wet Etching

Glass etching in HF


Miscellaneous

Lift-off process with KLIR 15 Resist
Lift-off process with LOR10B/S1805 Resist
PDMS Process