Micro-fabrication in IMSE Cleanroom

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Acid Fume Hood AJA E-beam Evaporator ALD Instrument Asher Disco Dicing Saw Ellipsometer Heidelberg Laser Writer Mask Aligner 3" Mask Aligner 4" Nanofab PECVD Sytem Optical Microscope (Class 100) Optical Microscope (Class 10,000) Parylene Deposition System Probe Station Profilometer Reactive Ion Etch (RIE) CR-Solvent Fume Hood (1) CR-Solvent Fume Hood (2) L27-PDMS Fume Hood L27-Solvent Hood-A L27-Solvent Hood-B L27-Acid Hood Spin Coater Sputter Deposition Tool Thermal Evaporator Tube Furnace UV Ozone Cleaner

Laser Lithography System

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The Heidelberg DWL66+ Laser writer provides advanced patterning applications using 375 nm UV laser to pattern a single resist layer by either simple exposure, front side aligned exposure, or back side aligned exposure. In addition, the writer can generate 3D patterns by using gray scale mode in which the intensity of the laser is varied while the laser is rastered. The smallest feature size that can be printed is better than 600 nm. The resist thickness can range from 100 nm to 100 micrometer. It can also be used to make photomasks for mask based lithography system.

IMSE Contact & Approved Trainer:
Rahul Gupta (rgupta24@wustl.edu)

Training Documents:
NOTE: User must demonstrate skills to IMSE staff before independent use.
AutoCAD guidelines
Operating instructions
Gray Scale (3D) patterning with Laser Lithography and RIE
Recipe optimization guidelines

Click here to see existing recipes

Technical Info:
Instrument Specifications
AZP4620 Resist datasheet
KL IR 15 Resist datasheet
S1805 Resist datasheet
SU8-2025 Resist datasheet
SU8-2050 Resist datasheet