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An easy to use UV-LED mask aligner (KLOE UV-KUB3) that can perform photolithography on substrates up to 4" diameter and with resolution as small as 2 microns. Front-side alignment can now be performed with joypad controls in a matter of minutes. It can be useful in many research applications not limiting it to microelectronics, microfluidics, optics & photonics.

IMSE Contact & Approved Trainer:
Rahul Gupta (rgupta24@wustl.edu)

Training Documents:
NOTE: User must demonstrate skills to IMSE staff before independent use.
Operating instructions

Recipe:
N/A

Technical Info:
Instrument Specifications
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SU8-2050 Resist datasheet